|
|
|
| Magnetic Properties and Kinetics Parameters of Electroless Magnetic Loss CoFeB Films |
| LIU Chang��hui1,2,HE Hua��hui2,SHEN Xiang2,LI Hai��hua2 |
| 1. School of Computer Science and Engineering, Wuhan Institute Technology, Wuhan 430073, Hubei, China; 2. Department of Electronic Science and Technology, Huazhong University of Science and Technology, Wuhan 430074, Hubei, China |
|
|
|
|
Abstract Electroless CoFeB films with good soft magnetic properties were fabricated on polyester plastic substrate from sodium tartarate as a complexing agent. The plating rate of electroless CoFeB films is a function of concentration of sodium tetrahydroborate, pH of the plating bath, plating temperature and the metallic ratio. The estimated regression coefficient b0-b3 confidence interval, residual error r and confidence interval rint were confirmed by a computer program. The optimal composition of the plating bath was obtained and the dynamic electromagnetic parameters of films were measured in the 2-10 GHz range. At 2 GHz, the �̡�, �̡� of the electroless CoFeB films were 304 and 76��6, respectively, as the concentration of reducer is 1 g/L. Magnetic hysteresis loop of the deposited CoFeB films show a remanence close to the saturation magnetization and coercivity of about 55��7-127��4 A/m. The loops along the hard axis display low anisotropic field Hk of 2 388-3 582 A/m.
|
|
Received: 01 January 1900
|
|
|
|
|
|
|
2008, Vol. 15 
