The high temperature oxidation behavior of GH3230 was investigated at 1100℃ in air by means of TGA, XRD and SEM. The precipitation process of oxides is visually described. The results show that: the effect of Si element on high temperature oxidation of alloy is mainly reflected in two aspects. On the one hand, Si slows down the diffusion of Mn element in the oxidation process of alloy and causes difference in the composition of oxide scale after high temperature oxidation of GH3230 alloy; the main components of the oxide scale on the surface after oxidation at 1100℃ of the alloy that exclude Si elements are MnCr2O4 and Cr2O3, and of the alloy that contain Si element are Cr2O3. On the other hand, SiO2 is formed in the early stage of the oxidation of the alloy, which plays an important role in the further oxidation of the alloy and contributes to suppress the volatilization of chromium oxide in the later stage of oxidation.
Key words
silicon /
GH3230 alloy /
high temperature oxidation /
oxide scale
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