工艺参数对非平衡磁控溅射Ti/TiN/Ti(C,N)薄膜硬度的影响
张以忱;吴宇峰;巴德纯;马胜歌
Influence of Processing Parameters on Hardness of Ti/TiN/Ti(C,N) Films Deposited by Unbalanced Magnetron Sputtering Technology
ZHANG Yichen;WU Yufeng;BA Dechun;MA Shengge
中国钢铁期刊网
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2007, (7): 50
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