Abstract: The normalized annealing of grain-oriented silicon steel significantly influences the primary recrystallization structure and texture through genetic effects. High-temperature normalizing promotes discontinuous recrystallization in hotrolled sheets,leading to increased grain size and weakened Goss( 110 < 001 >) texture in normalized sheets. During primary recrystallization annealing,a stronger η texture(< 100 >//RD) is formed due to the high proportion of shear bands. In contrast,low-temperature normalizing induces continuous recrystallization in hot-rolled sheets,enhancing the Goss texture in normalized sheets and enabling the formation of Goss texture with higher frequency and orientation accuracy after primary recrystallization. Without normalizing treatment,the fine grain size before cold rolling promotes grain boundary recrystallization nucleation,resulting in a stronger < 111 >//ND recrystallization texture and weaker η texture. Normalizing treatment increases the primary recrystallization grain size and distribution width,with higher normalizing temperatures leading to greater dispersion in grain size distribution. The subsurface grain size of low-temperature normalized recrystallized strips is finer than the core,while high-temperature normalized strips exhibit slightly larger subsurface grains compared to the central layer.